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[Problem-Solving Material] Surface Processing to Solve Issues with Photomasks

<Free rental of processed samples> Issues such as taking too long to clean photomasks and poor visibility of CCD cameras can be resolved with surface processing!

At Takeda Tokyo Process Service, we offer surface processing for photomasks. ~ Currently, we are publishing "Problem-Solving Materials Regarding Surface Processing of Photomasks"! ~ You can view it immediately from the [PDF Download] link below. [Overview of this document: Do you have any of these concerns regarding photomasks?] (1) Cleaning photomasks takes a lot of time... ⇒ How about coating the photomask? The hydrophobic properties of the coating can help prevent dirt and improve wipeability! (2) The visibility of the CCD camera is poor... ⇒ Surface roughening processing is recommended! By roughening the area around the photomask pattern, we can expect improved visibility for the camera through high contrast! For other concerns such as "It takes a long time to align the equipment..." or "I want to use the photomask for exposure after component mounting...", we offer solutions to these issues starting from surface processing. * This document can be viewed from the [PDF Download]. * We also offer free rental of processing samples. For details, please refer to the PDF document and feel free to contact us.

  • Photomask

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